High temperature resistant photoresist grating molding fabrication and replication technique and its application

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High temperature resistant photoresist grating molding fabrication and replication technique and its application

更新时间：2025-09-01

- High temperature resistant photoresist grating molding fabrication and replication technique and its application
- Issue 4, (1997)
- 作者机构：
  
  1:清华大学工程力学系
- 作者简介：
- 基金信息：
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- Published：1997
- 稿件说明：
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High temperature resistant photoresist grating molding fabrication and replication technique and its application[J]. 1997, (4).
DOI：

High temperature resistant photoresist grating molding fabrication and replication technique and its application[J]. 1997, (4). DOI：

摘要

作为试件变形传感元件的云纹光栅的制作是云纹干涉法的关键技术。本文提出了在１２０～２００℃高温下使用的光刻胶光栅模板的制作及在此温度下试件栅的复制工艺，并利用此技术研究了新型微电子封装组件在１２５～２０℃温度载荷下的热变形。实验结果表明：采用该方法可以获得高质量的试件栅，云纹条纹质量好，可用于试件微小区域内热变形的精确测量

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High temperature resistant photoresist grating molding fabrication and replication technique and its application

DOI：

摘要

Abstract

关键词

Keywords

references