Thermal field simulation of TC4 processing using nanosecond Double-pulse laser

JIANG Yongxia; LI Long; CHENG Yulu; YU Tianxi; ZHANG Chunling

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Thermal field simulation of TC4 processing using nanosecond Double-pulse laser

Laser Technology and Applications | 更新时间：2026-01-22

- Thermal field simulation of TC4 processing using nanosecond Double-pulse laser
- OPTICAL TECHNIQUE Vol. 52, Issue 1, Pages: 54-60(2026)
- 作者机构：
  
  1.西安建筑科技大学理学院，陕西西安 710055
  2.西安建筑科技大学应用物理研究所，陕西西安 710055
- 作者简介：
- 基金信息：
- DOI：
  CLC： TN249
- Received：02 September 2025，
  
  Revised：2025-10-30，
  
  Published：20 January 2026
- 稿件说明：
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姜永霞,李隆,程雨露等.纳秒双脉冲激光加工TC4的温场仿真[J].光学技术,2026,52(01):54-60.

JIANG Yongxia,LI Long,CHENG Yulu,et al.Thermal field simulation of TC4 processing using nanosecond Double-pulse laser[J].OPTICAL TECHNIQUE,2026,52(01):54-60.
姜永霞,李隆,程雨露等.纳秒双脉冲激光加工TC4的温场仿真[J].光学技术,2026,52(01):54-60. DOI：

JIANG Yongxia,LI Long,CHENG Yulu,et al.Thermal field simulation of TC4 processing using nanosecond Double-pulse laser[J].OPTICAL TECHNIQUE,2026,52(01):54-60. DOI：

摘要

针对TC4钛合金双脉冲激光加工过程中热-力耦合机制复杂、工艺参数缺乏理论指导的问题，研究通过建立多物理场耦合有限元模型，揭示了不同脉冲延迟时间下温度场演化与烧蚀形貌的形成规律。基于热焓-孔隙法与水平集法构建的二维模型，模拟了纳秒双脉冲激光与TC4材料的相互作用过程。结果表明：二次脉冲的温升效率相较于首次脉冲提升1.62倍，表现出显著的热累积效应；在微秒级延迟（1~4μs）下，双脉冲加工的热影响区较单脉冲显著减小，且延迟时间越短，烧蚀温度越高；在纳秒级延迟范围内，存在最佳参数窗口（延迟时间100ns），此时烧蚀温度达到峰值904.52K；烧蚀直径的演化强烈依赖于延迟时间，微秒级延迟下呈非线性扩展，而纳秒级延迟下则呈现准线性增长模式。本研究为优化双脉冲激光加工工艺参数提供了理论依据。

Abstract

Addressing the complexities of thermo-mechanical coupling mechanisms and the lack of theoretical guidance for process parameters in dual-pulse laser processing of TC4 titanium alloy

this study employs a multiphysics coupled finite element model to investigate the evolution of the temperature field and ablation morphology under different pulse delay times. A two-dimensional model integrating the enthalpy-porosity and level set methods was developed to simulate the interaction between nanosecond dual-pulse laser and TC4 material. The results indicate that the secondary pulse achieves a 1.62 times higher temperature rise efficiency than the first pulse

demonstrating a significant thermal accumulation effect. At microsecond-level delays （1~4 μs）

the heat-affected zone in dual-pulse processing is significantly smaller than that in single-pulse processing

with higher ablation temperatures observed at shorter delays. An optimal parameter window （100 ns delay） exists within the nanosecond delay range

where the ablation temperature peaks at 904.52 K. The evolution of the ablation diameter strongly depends on the delay time

exhibiting nonlinear expansion under microsecond delays and quasi-linear growth under nanosecond delays. This study provides a theoretical basis for optimizing dual-pulse laser processing parameters.

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references

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