显微光谱拟合法在微区薄膜表征中的优化与应用

孙习茹; 伍滨和

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显微光谱拟合法在微区薄膜表征中的优化与应用

光学测量与感知 | 更新时间：2025-09-22

- 显微光谱拟合法在微区薄膜表征中的优化与应用
- Optimization and application of microspectroscopic fitting method in micro-region thin film characterization
- 光学技术 2025年51卷第5期页码：634-640
- 作者机构：
  
  东华大学物理学院，上海201600
- 作者简介：
  
  孙习茹（1999— ），女，硕士研究生，从事薄膜微区特性表征研究。skullxray@163.com
  伍滨和（1976— ），男，研究员，博士，从事微纳光电材料与器件研究。bhwu@dhu.edu.cn
- 基金信息：
  
  上海市自然科学基金(24ZR1402600)
- DOI：
  中图分类号： O484.5
- 收稿：2025-04-21，
  
  修回：2025-06-22，
  
  纸质出版：2025-09-20
- 稿件说明：
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孙习茹,伍滨和.显微光谱拟合法在微区薄膜表征中的优化与应用[J].光学技术,2025,51(05):634-640.

SUN Xiru,WU Binhe.Optimization and application of microspectroscopic fitting method in micro-region thin film characterization[J].OPTICAL TECHNIQUE,2025,51(05):634-640.
孙习茹,伍滨和.显微光谱拟合法在微区薄膜表征中的优化与应用[J].光学技术,2025,51(05):634-640. DOI：

SUN Xiru,WU Binhe.Optimization and application of microspectroscopic fitting method in micro-region thin film characterization[J].OPTICAL TECHNIQUE,2025,51(05):634-640. DOI：

摘要

近年来随着晶圆和显示面板上的图案尺寸逐渐减小，对微小区域内薄膜参数的高精度测量需求愈发迫切。为实现多点、快速、无损的薄膜参数表征，文章构建了一套基于光学显微镜的微区测量系统（分辨率5~50

https://html.publish.founderss.cn/rc-pub/api/common/picture?pictureId=90194122&type=

3.13266683

https://html.publish.founderss.cn/rc-pub/api/common/picture?pictureId=90194124&type=

4.23333359

），结合光谱拟合法对薄膜参数进行提取。针对高数值孔径（

）物镜引起的复杂入射角分布与光强非均匀分布问题，文章选取高斯模型作为权重函数对建模误差进行补偿，通过优化模型参数获得更符合显微测量系统特性的反射率值。实验结果表明该方法显著提高了测量精度，薄膜厚度测量误差均小于1.2%，重复测量相对标准差优于2%，适用于在微小区域的高精度厚度测量与结构识别，能够实现多点扫描与形貌表征。

Abstract

In recent years

as the pattern sizes on wafers and display panels continue to shrink

the demand for high-precision measurement of thin-film parameters in small areas has become increasingly urgent. To achieve multi-point

fast

and non-destructive thin-film parameter characterization

a micro-region measurement system based on optical microscopy （resolution: 5–50

https://html.publish.founderss.cn/rc-pub/api/common/picture?pictureId=90194144&type=

3.13266683

https://html.publish.founderss.cn/rc-pub/api/common/picture?pictureId=90194145&type=

1.77800000

m）

combined with spectral fitting methods for extracting thin-film parameters

is presented. To address the complex incident angle distribution and non-uniform light intensity distribution caused by high numerical aperture （

） objectives

a Gaussian model is selected as the weight function to compensate for modeling errors. By optimizing the model parameters

reflection values that better align with the chara

cteristics of the microscopy system are obtained. Experimental results show that this method significantly improves measurement accuracy

with thin-film thickness measurement errors below 1.2%

and the relative standard deviation of repeat measurements better than 2%. This approach is suitable for high-precision thickness measurement and structural identification in small areas

enabling multi-point scanning and morphology characterization.

关键词

Keywords

references

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