三电极静电透镜构型优化超快电子脉冲聚焦仿真

李梦超; 郭勇; 丁宁; 陈维; 黄骏; 倪维元; 王兴权

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三电极静电透镜构型优化超快电子脉冲聚焦仿真

电子光学 | 更新时间：2026-01-22

- 三电极静电透镜构型优化超快电子脉冲聚焦仿真
- Optimization of einzel lens configuration for ultrafast electron pulse focusing simulation
- 光学技术 2026年52卷第1期页码：123-128
- 作者机构：
  
  赣南师范大学物理与电子信息学院，江西赣州 341000
- 作者简介：
  
  李梦超（1988— ），男，讲师，博士，从事超快电子衍射技术研究。limenechao@gnnu.edu.cn
- 基金信息：
  
  江西省教育厅科技项目(GJJ201437);国家自然科学基金资助项目(22061002;52067002);江西省主要学科学术和技术带头人-领军人才项目(20225BCJ22003)
- DOI：
  中图分类号： O463
- 收稿：2025-09-18，
  
  修回：2025-11-18，
  
  纸质出版：2026-01-20
- 稿件说明：
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李梦超,郭勇,丁宁等.三电极静电透镜构型优化超快电子脉冲聚焦仿真[J].光学技术,2026,52(01):123-128.

LI Mengchao,GUO Yong,DING Ning,et al.Optimization of einzel lens configuration for ultrafast electron pulse focusing simulation[J].OPTICAL TECHNIQUE,2026,52(01):123-128.
李梦超,郭勇,丁宁等.三电极静电透镜构型优化超快电子脉冲聚焦仿真[J].光学技术,2026,52(01):123-128. DOI：

LI Mengchao,GUO Yong,DING Ning,et al.Optimization of einzel lens configuration for ultrafast electron pulse focusing simulation[J].OPTICAL TECHNIQUE,2026,52(01):123-128. DOI：

摘要

采用有限元（PS）联合N-particle粒子仿真（GPT）对中国科学院物理研究所100 keV超快电子衍射装置进行三电极静电透镜（EL）聚焦仿真，通过研究不同构型静电透镜，提出三电极静电透镜设计建议。仿真显示，对于中间电极的中心孔，当初始脉冲半径0.1毫米时，缩小孔径可使电子脉冲聚焦至39微米及以下。厚度和孔径固定，孔其两侧边缘为椭圆倒角时，缩小平行轴B可使电子脉冲聚焦至49微米及以下；而圆形倒角缩小倒角半径可使电子脉冲聚焦至39微米。仿真发现，通常电极板厚度越薄，聚焦效果越好，然而孔边缘倒角半径1 毫米时，存在最优厚度6毫米，此时电子脉冲可聚焦至38微米。电透镜的焦距与孔半径和孔深成正比，与椭圆倒角的平行轴B或圆形倒角的半径成正比。超快电子脉冲在电透镜下的聚焦行为与电子束流具有相似性。仿真结果对静电透镜在超快电子衍射（UED）中的应用具有促进作用，对超快电子脉冲光学、透射电子显微镜和扫描电子显微镜等领域也具有极强的实际应用价值。

Abstract

The finite element method （Poisson Superfish） and the general particle tracer are used to simulate the einzel lens of the 100 keV ultrafast electron diffraction device in the Institute of Physics

Chinese Academy of Sciences. The simulation studies the focusing behavior of 100 keV ultrafast electron pulses under different configurations of electrostatic lenses

addressing the core issues in the three-electrode electrostatic lenses. Small electrode holes

small hole arc edges

and thin thickness are necessary for better focusing. For a pulse with a radius of 0.1 millimeters

it can be focused to 39 micrometers when the aperture is reduced. Small radius circular arc or small B value elliptical arc are also needed of hole edges for strong pulse focusing. The electron pulse can be focused to a diameter of 49 micrometers by reducing the B-axis of the elliptical arc of the hole. When the arc of the hole is circular

reducing its radius can focus the electron pulse to 39 micrometers. When the hole's arc radius is 1 millimeter

there exists an optimal thickness of 6 millimeters

at which the electronic pulse can be focused to 38 micrometers. The focusing behavior of ultrafast electron pulses under electric lens is similar to electron beams. These results can promote the application of electric lenses in UED. The results are also useful for the development of electron beam optics

transmission electron microscopy

and scanning electron microscopy. This article has strong practical application value.

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references

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